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November 08, 2016 – Santa Clara, CA – The technical team at Brewer Science will be showcasing new sensor technology featuring Brewer Science devices at Printed Electronics USA, which is…
November 08, 2016 Press Release Read MoreOctober 28, 2016 – Orlando, FL – Brewer Science, a technology pioneer, will be showcasing new sensor technology at IEEE SENSORS 2016, October 30 through November 2 in Orlando, Florida.…
Read MoreOctober 24-26, 2016 Hiroshima, Japan http://euvl2016.org/ Please look for Tanti Ouattara's poster at 2016 International EUVL Symposium.
Read MoreOctober 18, 2016 – Springfield, MO - Brewer Science welcomed Japanese Ambassador Kenichiro Sasae and Congressman Billy Long (MO-7) to its Springfield facility located at the Jordan Valley Innovation Center…
Read MoreA variety of factors can affect the coat quality when spin processing. This article will focus on the role that the bowl environment, and in particlar the ability to control…
Read MoreHigh-k metal gate (HKMG) technology has become one of the front-runners for the next generation of CMOS devices. This new technology incorporates a high-k dielectric, which reduces leakage and improves…
Read MoreNew lithographic compositions, for use as middle layers in trilayer processes resist processes can be applied as very thin films with a very thin layer of photoresist being applied to…
Read MoreProcess application engineers often encounter a variety of complex challenges related to deposition by spin coating, as many variables affect the quality of the spin-applied coating. These variables have critical…
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