Patents

At Brewer Science, we believe that protecting our ideas and inventions is an investment in ourselves and the future of our company. We know that even though changing technologies allow many products to be made more easily and information is much more readily available than ever before, our inventions are no less valuable to us and to the world. Through the security of intellectual property protection, we are able to bring you innovative products.

SG11,201,900,281XB

Laser ablative dielectric material

11,574,805B2

Selective liquiphobic surface modification of substrates

TWI,791,618B

A microelectronic structure and a method of forming such microelectronic structure

11,610,801B2

Laser-releasable bonding materials for 3-D IC applications

DE602,018,055,240T2

VERBINDUNGSMATERIALIEN FÜR 3D-IC-ANWENDUNGEN

3,727,838B1

Laser-releasable bonding materials for 3-d IC applications

11,768,435B2

Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces

JP7,356,902B2

Dielectric materials for laser ablation

DE602,017,075,549T2

BLOCKCOPOLYMERE MIT HOHEM CHI FÜR GERICHTETE SELBSTANORDNUNG

EP3,554,830B1

High-chi block copolymers for directed self-assembly

11,574,805B2

Selective liquiphobic surface modification of substrates

11,610,801B2

Laser-releasable bonding materials for 3-D IC applications

11,768,435B2

Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces

11,361,967B2

Underlayers for EUV lithography

TW1786062B

Environmental Sensor and Method for Environmental Sensor

KR102472617B1

Superflattened spin-on carbon material

AT508318B1

PROCEDURE FOR A TEMPORARY MOUNTING OF A DEVICE WAFER ON A SUPPORT SUBSTRATE

11,385,196,B2

Energetic pulse clearing of environmentally sensitive thin-film devices

11,385,196B2

Energetic pulse clearing of environmentally sensitive thin-film devices

KR102404034B1

3 IC polyimides as laser release materials for 3-d IC applICations

EP3523823B1

Chemically patterned guide layers for use in chemoepitaxy directing of block co-polymers

EP2419926B1

Acid-etch resistant, protective coatings

KR102364329B1

High-chi block copolymers for directed self-assembly

KR102351530B1

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer

6,080,530

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

6,042,990

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

6,156,479

Thermosetting anti-reflective coatings

5,998,090

High optical density ultra thin organic black matrix system

5,935,760

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,919,599

Thermosetting anti-reflective coatings at deep ultraviolet

5,919,598

Method for making multilayer resist structures with thermosetting anti-reflective coatings

5,892,096

Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility

5,629,665

Conducting-polymer bolometer

5,693,691

Thermosetting anti-reflective coatings compositions

5,688,987

Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility

5,674,648

Anti-reflective coating

5,578,676

Method for making polymers with intrinsic light-absorbing properties

6,852,474

Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

6,869,747

Organic polymeric antireflective coatings deposited by chemical vapor deposition

6,900,000

Organic polymeric antireflective coatings deposited by chemical vapor deposition

6,936,405

Organic polymeric antireflective coatings deposited by chemical vapor deposition

8,257,910

Underlayers for EUV lithography

RE40920

Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers

Pending

Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces

RE41128

Organic anti-reflective coating compositions for advanced microlithography

10,331,032

Photosensitive, developer-soluble bottom anti-reflective coating material

9,638,999

Dual-layer light-sensitive developer soluble bottom anti-reflective coatings for 193-nm lithography

9,328,426

Nonpolymeric antireflection compositions containing adamantyl groups

6,080,530

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

6,042,990

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,935,760

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,919,599

Thermosetting anti-reflective coatings at deep ultraviolet

5,919,598

Method for making multilayer resist structures with thermosetting anti-reflective coatings

5,892,096

Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility

5,693,691

Thermosetting anti-reflective coatings compositions

5,688,987

Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility

5,674,648

Anti-reflective coating

5,578,676

Method for making polymers with intrinsic light-absorbing properties

5,368,989

Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating

6,893,684

Anti-reflective coating compositions for use with low-k dielectric materials

6,872,506

Wet-developable anti-reflective compositions

6,846,612

Organic anti-reflective coating compositions for advanced microlithography

6,680,160

Halogenated anti-reflective coatings

6,670,425

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,663,916

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,653,411

Anti-reflective coating compositions comprising polymerized aminoplasts

6,576,408

Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose

6,555,287

Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings

6,524,708

Anti-reflective coating compositions comprising polymerized aminoplasts

6,512,084

Anti-reflective coating compositions comprising polymerized aminoplasts

6,495,305

Halogenated anti-reflective coatings

6,444,320

Thermosetting anti-reflective coatings for full fill dual damascene process

6,432,611

Anti-reflective coating compositions comprising polymerized aminoplasts

6,403,152

Anti-reflective coating compositions comprising polymerized aminoplasts

6,399,686

Anti-reflective coating compositions comprising polymerized aminoplasts

6,391,472

Fill material for dual damascene process

6,323,310

Anti-reflective coating compositions comprising polymerized aminoplasts

6,316,160

Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders

6,156,479

Thermosetting anti-reflective coatings

9,110,372

Anti-reflective coatings using vinyl ether crosslinkers

8,383,318

Acid-sensitive, developer-soluble bottom anti-reflective coatings

8,257,910

Underlayers for EUV lithography

7,998,318

Crosslinkable fill compositions for uniformly protecting via and contact holes

7,914,974

Anti-reflective imaging layer for multiple patterning process

7,754,818

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,745,540

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,608,380

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,601,483

Anti-reflective coatings using vinyl ether crosslinkers

7,507,783

Thermally curable middle layer comprising polyhedral oligomeric silsesquioxanes for 193-nm trilayer resist process

7,364,835

Developer-soluble materials and methods of using the same in via-first dual damascene applications

7,323,289

Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

7,261,997

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,132,219

Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

7,132,216

Non-aromatic chromophores for use in polymer anti-reflective coatings

7,108,958

Photosensitive bottom anti-reflective coating

7,038,328

Anti-reflective compositions comprising triazine compounds

7,026,237

Fill material for dual damascene processes

6,962,769

Anti-reflective coating composition with improved spin bowl compatibility

6,894,104

Anti-reflective coatings and dual damascene fill compositions comprising stryrene-allyl alcohol copolymers

11,361,967B2

Underlayers for EUV lithography

TW1786062B

Environmental Sensor and Method for Environmental Sensor

KR102472617B1

Superflattened spin-on carbon material

AT508318B1

PROCEDURE FOR A TEMPORARY MOUNTING OF A DEVICE WAFER ON A SUPPORT SUBSTRATE

11,385,196,B2

Energetic pulse clearing of environmentally sensitive thin-film devices

11,385,196B2

Energetic pulse clearing of environmentally sensitive thin-film devices

KR102404034B1

3 IC polyimides as laser release materials for 3-d IC applICations

EP3523823B1

Chemically patterned guide layers for use in chemoepitaxy directing of block co-polymers

EP2419926B1

Acid-etch resistant, protective coatings

KR102364329B1

High-chi block copolymers for directed self-assembly

KR102351530B1

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer

9,111,757

Silicone polymers with high refractive indices and extended pot life

10,961,383

Gradient block copolymers for directed self-assembly

10,968,348

Laser-releasable bonding materials for 3-D IC applications

11,078,337

High-Chi Block Copolymers for Directed Self-Assembly

Pending

High-energy pulse clearing of environmentally sensitive CNT thin-film devices

Pending

Adhesion layers for EUV lithography

Pending

Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces

Pending

Laser-Releasable Bonding Materials for 3-D IC Applications

Pending

Poly(cyanocinnamate)s for structural and optical applications

Pending

Permanent bonding and patterning material

Pending

Underlayers for EUV Lithography

Pending

Selective liquidphobic surface modifications

Pending

High-silicon-content wet-removable planarizing layer

Pending

Printable dispersion with tunable viscosity

Pending

Multifunctional materials for temporary bond and debond

pending

Laser-releasable bonding materials for 3-d IC applications

10,961,383

Gradient block copolymers for directed self-assembly

10,854,451

Superplanarizing spin-on carbon materials

10,770,813

Environmentally sealed, reusable connector for printed flexible electronics

10,734,239

High-chi block copolymers with tunable glass transition temperatures for directed self-assembly

10,617,010

Polymer film stencil process for fan-out wafer-level packaging of semiconductor devices

10,519,333

Multifunctional alcohol dispersions of carbon nanotubes

10,421,878

High-Chi block copolymers for directed self-assembly

10,366,887

Method of using chemically patterned guide layers in chemoepitaxy directing of block co-polymers

10,352,726

Thin-film resistive-based sensor

10,331,032

Photosensitive, developer-soluble bottom anti-reflective coating material

10,329,451

All-organic high refractive index materials

10,317,291

Environmental sensor system and signal processor

10,304,720

Laser ablative dielectric material

RE46841

Spin-on carbon compositions for lithographic processing

10,103,048

Dual-layer bonding material process for temporary bonding of microelectronic substrates to carrier substrates

9,960,038

Processes to pattern small features for advanced patterning needs

9,865,490

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,827,757

Methods of transferring device wafers or layers between carrier substrates and other surfaces

9,827,740

Polyimides as laser release materials for 3-D IC applications

9,738,805

Highly soluble carbon nanotubes with enhanced conductivity

9,728,439

High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach

9,642,258

All-organic inductor-capacitor tank circuit for radio frequency sensor applications

9,640,396

Spin-on spacer materials for double- and triple-patterning lithography

9,638,999

Dual-layer light-sensitive developer soluble bottom anti-reflective coatings for 193-nm lithography

9,611,346

Highly crosslinked polymer dielectric films for improved capacitor performance

9,496,164

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,482,951

Non-covalently crosslinkable materials for photolithography processes

9,472,436

Multiple bonding layers for thin-wafer handling

9,328,426

Nonpolymeric antireflection compositions containing adamantyl groups

9,299,778

CVD-free, scalable processes for the production of silicon micro- and nanostructures

5,629,665

Conducting-polymer bolometer

5,998,090

High optical density ultra thin organic black matrix system

8,836,082

Reversal lithography approach by selective deposition of nanoparticles

8,668,992

Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients

9,117,757

Silicone polymers with high refractive indices and extended pot life

9,263,314

Multiple bonding layers for thin-wafer handling

8,852,391

Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate

8,771,442

Cyclic olefin compositions for temporary wafer bonding

8,865,599

Self-leveling planarization materials for microelectronic topography

9,224,631

Multiple bonding layers for thin-wafer handling

9,127,126

Development of high-viscosity bonding layer through in-situ polymer chain extension

9,111,981

Method for reversibly mounting a device wafer to a carrier substrate

9,099,512

Article including a device wafer reversibly mountable to a carrier substrate

8,940,104

Cleaning composition for temporary wafer bonding materials

9,157,003

Highly soluble carbon nanotubes with enhanced conductivity

9,249,013

Silicon hardmask layer for directed self-assembly

8,771,927

Acid-etch resistant, protective coatings

9,123,541

Highly etch-resistant polymer block for use in block copolymers for directed self-assembly

5,368,989

Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating

5,578,676

Method for making polymers with intrinsic light-absorbing properties

5,693,691

Thermosetting anti-reflective coatings compositions

5,688,987

Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility

5,674,648

Anti-reflective coating

5,935,760

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,919,599

Thermosetting anti-reflective coatings at deep ultraviolet

5,919,598

Method for making multilayer resist structures with thermosetting anti-reflective coatings

5,892,096

Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility

8,895,230

Spin-on carbon compositions for lithographic processing

8,877,430

Methods of producing structures using a developer-soluble layer with multilayer technology

8,808,969

Method of making radiation-sensitive sol-gel materials

8,647,809

Metal-oxide films from small molecules for lithographic applications

9,102,129

Spin-on carbon compositions for lithographic processing

8,968,989

Assist layers for EUV lithography

9,110,372

Anti-reflective coatings using vinyl ether crosslinkers

7,449,230

Lithography pattern shrink process and articles

Pending

Adhesion layers for EUV lithography

Pending

Underlayers for EUV Lithography

10,854,451

Superplanarizing spin-on carbon materials

RE46841

Spin-on carbon compositions for lithographic processing

9,960,038

Processes to pattern small features for advanced patterning needs

9,640,396

Spin-on spacer materials for double- and triple-patterning lithography

9,482,951

Non-covalently crosslinkable materials for photolithography processes

8,133,659

On-track process for patterning hardmask by multiple dark field exposures

7,939,244

Photosensitive hardmask for microlithography

7,602,066

Method of filling structures for forming via-first dual damascene interconnects

7,364,832

Wet developable hard mask in conjunction with thin photoresist for microphotolithography

7,348,281

Method of filling structures for forming via-first dual damascene interconnects

7,122,296

Lithography pattern shrink process and articles

6,740,469

Developer-soluble metal alkoxide coatings for microelectronic applications

9,102,129

Spin-on carbon compositions for lithographic processing

8,968,989

Assist layers for EUV lithography

8,895,230

Spin-on carbon compositions for lithographic processing

8,877,430

Methods of producing structures using a developer-soluble layer with multilayer technology

8,808,969

Method of making radiation-sensitive sol-gel materials

8,647,809

Metal-oxide films from small molecules for lithographic applications

8,415,083

On-track process for patterning hardmask by multiple dark field exposures

8,206,893

Photoimageable branched polymer

8,168,372

Method of creating photolithographic structures with developer-trimmed hardmask

11,385,196B2

Energetic pulse clearing of environmentally sensitive thin-film devices

EP2419926B1

Acid-etch resistant, protective coatings

KR102364329B1

High-chi block copolymers for directed self-assembly

KR102351530B1

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer

7,449,230

Lithography pattern shrink process and articles

8,257,910

Underlayers for EUV lithography

9,111,757

Silicone polymers with high refractive indices and extended pot life

10,961,383

Gradient block copolymers for directed self-assembly

10,968,348

Laser-releasable bonding materials for 3-D IC applications

11,078,337

High-Chi Block Copolymers for Directed Self-Assembly

RE40920

Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers

10,961,383

Gradient block copolymers for directed self-assembly

RE41128

Organic anti-reflective coating compositions for advanced microlithography

10,854,451

Superplanarizing spin-on carbon materials

10,770,813

Environmentally sealed, reusable connector for printed flexible electronics

10,734,239

High-chi block copolymers with tunable glass transition temperatures for directed self-assembly

10,617,010

Polymer film stencil process for fan-out wafer-level packaging of semiconductor devices

10,519,333

Multifunctional alcohol dispersions of carbon nanotubes

10,421,878

High-Chi block copolymers for directed self-assembly

10,366,887

Method of using chemically patterned guide layers in chemoepitaxy directing of block co-polymers

10,352,726

Thin-film resistive-based sensor

10,331,032

Photosensitive, developer-soluble bottom anti-reflective coating material

10,329,451

All-organic high refractive index materials

10,317,291

Environmental sensor system and signal processor

10,304,720

Laser ablative dielectric material

RE46841

Spin-on carbon compositions for lithographic processing

10,103,048

Dual-layer bonding material process for temporary bonding of microelectronic substrates to carrier substrates

9,960,038

Processes to pattern small features for advanced patterning needs

9,865,490

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,827,757

Methods of transferring device wafers or layers between carrier substrates and other surfaces

9,827,740

Polyimides as laser release materials for 3-D IC applications

9,738,805

Highly soluble carbon nanotubes with enhanced conductivity

9,728,439

High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach

9,642,258

All-organic inductor-capacitor tank circuit for radio frequency sensor applications

9,640,396

Spin-on spacer materials for double- and triple-patterning lithography

9,638,999

Dual-layer light-sensitive developer soluble bottom anti-reflective coatings for 193-nm lithography

9,611,346

Highly crosslinked polymer dielectric films for improved capacitor performance

9,496,164

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,482,951

Non-covalently crosslinkable materials for photolithography processes

9,472,436

Multiple bonding layers for thin-wafer handling

9,328,426

Nonpolymeric antireflection compositions containing adamantyl groups

7,579,044

Process and device for coating the outer edge of a substrate during microelectronics manufacture

9,299,778

CVD-free, scalable processes for the production of silicon micro- and nanostructures

9,117,757

Silicone polymers with high refractive indices and extended pot life

8,836,082

Reversal lithography approach by selective deposition of nanoparticles

8,668,992

Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients

7,976,894

Materials with thermally reversible curing mechanism

7,833,692

Amine-arresting additives for materials used in photolithographic processes

7,803,458

Hybrid organic-inorganic polymer coatings with high refractive indices

7,608,342

Photocurable, conductive, transparent polymer coatings

7,192,999

Polyimides for use as high refractive index, thin film materials

9,263,314

Multiple bonding layers for thin-wafer handling

9,224,631

Multiple bonding layers for thin-wafer handling

9,127,126

Development of high-viscosity bonding layer through in-situ polymer chain extension

9,111,981

Method for reversibly mounting a device wafer to a carrier substrate

9,099,512

Article including a device wafer reversibly mountable to a carrier substrate

8,940,104

Cleaning composition for temporary wafer bonding materials

8,852,391

Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate

8,771,442

Cyclic olefin compositions for temporary wafer bonding

8,236,669

High-temperature spin-on temporary bonding compositions

8,221,571

Cyclic olefin compositions for temporary wafer bonding

8,092,628

Cyclic olefin compositions for temporary wafer bonding

7,935,780

High-temperature spin-on temporary bonding compositions

9,157,003

Highly soluble carbon nanotubes with enhanced conductivity

8,865,599

Self-leveling planarization materials for microelectronic topography

7,455,955

Planarization method for multi-layer lithography processing

6,716,767

Contact planarization materials that generate no volatile byproducts or residue during curing

8,408,222

Device for coating the outer edge of a substrate during microelectronics manufacturing

8,133,659

On-track process for patterning hardmask by multiple dark field exposures

7,939,244

Photosensitive hardmask for microlithography

7,602,066

Method of filling structures for forming via-first dual damascene interconnects

7,348,281

Method of filling structures for forming via-first dual damascene interconnects

6,740,469

Developer-soluble metal alkoxide coatings for microelectronic applications

9,249,013

Silicon hardmask layer for directed self-assembly

9,123,541

Highly etch-resistant polymer block for use in block copolymers for directed self-assembly

8,771,927

Acid-etch resistant, protective coatings

8,445,591

Spin-on protective coatings for wet-etch processing of microelectronic substrates

8,399,346

Scratch-resistant coatings for protecting front-side circuitry during backside processing

8,268,449

Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive

8,202,442

Spin-on protective coatings for wet-etch processing of microelectronic substrates

8,192,642

Spin-on protective coatings for wet-etch processing of microelectronic substrates

7,758,913

Spin-on protective coatings for wet-etch processing of microelectronic substrates

7,709,178

Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride

7,695,890

Negative photoresist for silicon KOH etch without silicon nitride

7,678,861

Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive

7,316,844

Spin-on protective coatings for wet-etch processing of microelectronic substrate

9,102,129

Spin-on carbon compositions for lithographic processing

8,968,989

Assist layers for EUV lithography

8,895,230

Spin-on carbon compositions for lithographic processing

8,877,430

Methods of producing structures using a developer-soluble layer with multilayer technology

8,808,969

Method of making radiation-sensitive sol-gel materials

8,647,809

Metal-oxide films from small molecules for lithographic applications

8,415,083

On-track process for patterning hardmask by multiple dark field exposures

8,206,893

Photoimageable branched polymer

8,168,372

Method of creating photolithographic structures with developer-trimmed hardmask

6,893,684

Anti-reflective coating compositions for use with low-k dielectric materials

6,872,506

Wet-developable anti-reflective compositions

6,846,612

Organic anti-reflective coating compositions for advanced microlithography

6,680,160

Halogenated anti-reflective coatings

6,663,916

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,512,084

Anti-reflective coating compositions comprising polymerized aminoplasts

6,432,611

Anti-reflective coating compositions comprising polymerized aminoplasts

9,110,372

Anti-reflective coatings using vinyl ether crosslinkers

8,383,318

Acid-sensitive, developer-soluble bottom anti-reflective coatings

8,257,910

Underlayers for EUV lithography

7,998,318

Crosslinkable fill compositions for uniformly protecting via and contact holes

7,914,974

Anti-reflective imaging layer for multiple patterning process

7,754,818

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,745,540

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,608,380

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,601,483

Anti-reflective coatings using vinyl ether crosslinkers

7,507,783

Thermally curable middle layer comprising polyhedral oligomeric silsesquioxanes for 193-nm trilayer resist process

7,364,835

Developer-soluble materials and methods of using the same in via-first dual damascene applications

7,323,289

Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

7,261,997

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,108,958

Photosensitive bottom anti-reflective coating

7,038,328

Anti-reflective compositions comprising triazine compounds

6,894,104

Anti-reflective coatings and dual damascene fill compositions comprising stryrene-allyl alcohol copolymers

7,749,603

Two-layer transparent electrostatic charge dissipating coating

6,303,270

Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

5,998,090

High optical density ultra thin organic black matrix system

5,629,665

Conducting-polymer bolometer

7,713,835

Thermally decomposable spin-on bonding compositions for temporary wafer bonding

7,364,832

Wet developable hard mask in conjunction with thin photoresist for microphotolithography

6,080,530

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

6,042,990

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,935,760

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,919,599

Thermosetting anti-reflective coatings at deep ultraviolet

5,919,598

Method for making multilayer resist structures with thermosetting anti-reflective coatings

5,892,096

Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility

5,688,987

Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility

5,674,648

Anti-reflective coating

5,578,676

Method for making polymers with intrinsic light-absorbing properties

5,368,989

Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating

6,670,425

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,653,411

Anti-reflective coating compositions comprising polymerized aminoplasts

6,555,287

Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings

6,524,708

Anti-reflective coating compositions comprising polymerized aminoplasts

6,495,305

Halogenated anti-reflective coatings

6,444,320

Thermosetting anti-reflective coatings for full fill dual damascene process

6,403,152

Anti-reflective coating compositions comprising polymerized aminoplasts

6,399,686

Anti-reflective coating compositions comprising polymerized aminoplasts

6,391,472

Fill material for dual damascene process

6,323,310

Anti-reflective coating compositions comprising polymerized aminoplasts

6,316,160

Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders

6,156,479

Thermosetting anti-reflective coatings

11,385,196B2

Energetic pulse clearing of environmentally sensitive thin-film devices

EP2419926B1

Acid-etch resistant, protective coatings

KR102364329B1

High-chi block copolymers for directed self-assembly

KR102351530B1

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer

6,737,203

Photosensitive resin compositions for color filter applications

6,756,418

Photosensitive resin compositions for color filter applications

6,852,473

Anti-reflective coating conformality control

6,852,474

Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

6,869,747

Organic polymeric antireflective coatings deposited by chemical vapor deposition

6,900,000

Organic polymeric antireflective coatings deposited by chemical vapor deposition

6,936,405

Organic polymeric antireflective coatings deposited by chemical vapor deposition

7,449,230

Lithography pattern shrink process and articles

8,257,910

Underlayers for EUV lithography

9,111,757

Silicone polymers with high refractive indices and extended pot life

10,961,383

Gradient block copolymers for directed self-assembly

10,968,348

Laser-releasable bonding materials for 3-D IC applications

11,078,337

High-Chi Block Copolymers for Directed Self-Assembly

RE40920

Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers

Pending

High-energy pulse clearing of environmentally sensitive CNT thin-film devices

Pending

Adhesion layers for EUV lithography

Pending

Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces

Pending

Laser-Releasable Bonding Materials for 3-D IC Applications

Pending

Poly(cyanocinnamate)s for structural and optical applications

Pending

Permanent bonding and patterning material

Pending

Underlayers for EUV Lithography

Pending

Selective liquidphobic surface modifications

Pending

High-silicon-content wet-removable planarizing layer

Pending

Printable dispersion with tunable viscosity

Pending

Multifunctional materials for temporary bond and debond

pending

Laser-releasable bonding materials for 3-d IC applications

10,961,383

Gradient block copolymers for directed self-assembly

RE41128

Organic anti-reflective coating compositions for advanced microlithography

10,854,451

Superplanarizing spin-on carbon materials

10,770,813

Environmentally sealed, reusable connector for printed flexible electronics

10,734,239

High-chi block copolymers with tunable glass transition temperatures for directed self-assembly

10,617,010

Polymer film stencil process for fan-out wafer-level packaging of semiconductor devices

10,519,333

Multifunctional alcohol dispersions of carbon nanotubes

10,421,878

High-Chi block copolymers for directed self-assembly

10,366,887

Method of using chemically patterned guide layers in chemoepitaxy directing of block co-polymers

10,352,726

Thin-film resistive-based sensor

10,331,032

Photosensitive, developer-soluble bottom anti-reflective coating material

10,329,451

All-organic high refractive index materials

10,317,291

Environmental sensor system and signal processor

10,304,720

Laser ablative dielectric material

RE46841

Spin-on carbon compositions for lithographic processing

10,103,048

Dual-layer bonding material process for temporary bonding of microelectronic substrates to carrier substrates

9,960,038

Processes to pattern small features for advanced patterning needs

9,865,490

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,827,757

Methods of transferring device wafers or layers between carrier substrates and other surfaces

9,827,740

Polyimides as laser release materials for 3-D IC applications

9,738,805

Highly soluble carbon nanotubes with enhanced conductivity

9,728,439

High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach

9,642,258

All-organic inductor-capacitor tank circuit for radio frequency sensor applications

9,640,396

Spin-on spacer materials for double- and triple-patterning lithography

9,638,999

Dual-layer light-sensitive developer soluble bottom anti-reflective coatings for 193-nm lithography

9,611,346

Highly crosslinked polymer dielectric films for improved capacitor performance

9,496,164

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,482,951

Non-covalently crosslinkable materials for photolithography processes

9,472,436

Multiple bonding layers for thin-wafer handling

9,328,426

Nonpolymeric antireflection compositions containing adamantyl groups

7,579,044

Process and device for coating the outer edge of a substrate during microelectronics manufacture

9,299,778

CVD-free, scalable processes for the production of silicon micro- and nanostructures

9,117,757

Silicone polymers with high refractive indices and extended pot life

8,836,082

Reversal lithography approach by selective deposition of nanoparticles

8,668,992

Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients

7,976,894

Materials with thermally reversible curing mechanism

7,833,692

Amine-arresting additives for materials used in photolithographic processes

7,803,458

Hybrid organic-inorganic polymer coatings with high refractive indices

7,608,342

Photocurable, conductive, transparent polymer coatings

7,192,999

Polyimides for use as high refractive index, thin film materials

7,749,603

Two-layer transparent electrostatic charge dissipating coating

6,303,270

Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

5,998,090

High optical density ultra thin organic black matrix system

5,629,665

Conducting-polymer bolometer

9,263,314

Multiple bonding layers for thin-wafer handling

9,224,631

Multiple bonding layers for thin-wafer handling

9,127,126

Development of high-viscosity bonding layer through in-situ polymer chain extension

9,111,981

Method for reversibly mounting a device wafer to a carrier substrate

9,099,512

Article including a device wafer reversibly mountable to a carrier substrate

8,940,104

Cleaning composition for temporary wafer bonding materials

8,852,391

Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate

8,771,442

Cyclic olefin compositions for temporary wafer bonding

8,236,669

High-temperature spin-on temporary bonding compositions

8,221,571

Cyclic olefin compositions for temporary wafer bonding

8,092,628

Cyclic olefin compositions for temporary wafer bonding

7,935,780

High-temperature spin-on temporary bonding compositions

9,157,003

Highly soluble carbon nanotubes with enhanced conductivity

8,865,599

Self-leveling planarization materials for microelectronic topography

7,455,955

Planarization method for multi-layer lithography processing

6,716,767

Contact planarization materials that generate no volatile byproducts or residue during curing

8,408,222

Device for coating the outer edge of a substrate during microelectronics manufacturing

7,713,835

Thermally decomposable spin-on bonding compositions for temporary wafer bonding

7,790,231

Automated process and apparatus for planarization of topographical surfaces

7,775,785

Contact planarization apparatus

8,133,659

On-track process for patterning hardmask by multiple dark field exposures

7,939,244

Photosensitive hardmask for microlithography

7,602,066

Method of filling structures for forming via-first dual damascene interconnects

7,348,281

Method of filling structures for forming via-first dual damascene interconnects

6,740,469

Developer-soluble metal alkoxide coatings for microelectronic applications

9,249,013

Silicon hardmask layer for directed self-assembly

9,123,541

Highly etch-resistant polymer block for use in block copolymers for directed self-assembly

8,771,927

Acid-etch resistant, protective coatings

8,445,591

Spin-on protective coatings for wet-etch processing of microelectronic substrates

8,399,346

Scratch-resistant coatings for protecting front-side circuitry during backside processing

8,268,449

Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive

8,202,442

Spin-on protective coatings for wet-etch processing of microelectronic substrates

8,192,642

Spin-on protective coatings for wet-etch processing of microelectronic substrates

7,758,913

Spin-on protective coatings for wet-etch processing of microelectronic substrates

7,709,178

Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride

7,695,890

Negative photoresist for silicon KOH etch without silicon nitride

7,678,861

Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive

7,316,844

Spin-on protective coatings for wet-etch processing of microelectronic substrate

7,364,832

Wet developable hard mask in conjunction with thin photoresist for microphotolithography

7,122,296

Lithography pattern shrink process and articles

9,102,129

Spin-on carbon compositions for lithographic processing

8,968,989

Assist layers for EUV lithography

8,895,230

Spin-on carbon compositions for lithographic processing

8,877,430

Methods of producing structures using a developer-soluble layer with multilayer technology

8,808,969

Method of making radiation-sensitive sol-gel materials

8,647,809

Metal-oxide films from small molecules for lithographic applications

8,415,083

On-track process for patterning hardmask by multiple dark field exposures

8,206,893

Photoimageable branched polymer

8,168,372

Method of creating photolithographic structures with developer-trimmed hardmask

6,080,530

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

6,042,990

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,935,760

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,919,599

Thermosetting anti-reflective coatings at deep ultraviolet

5,919,598

Method for making multilayer resist structures with thermosetting anti-reflective coatings

5,892,096

Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility

5,688,987

Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility

5,674,648

Anti-reflective coating

5,578,676

Method for making polymers with intrinsic light-absorbing properties

5,368,989

Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating

6,893,684

Anti-reflective coating compositions for use with low-k dielectric materials

6,872,506

Wet-developable anti-reflective compositions

6,846,612

Organic anti-reflective coating compositions for advanced microlithography

6,680,160

Halogenated anti-reflective coatings

6,663,916

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,512,084

Anti-reflective coating compositions comprising polymerized aminoplasts

6,432,611

Anti-reflective coating compositions comprising polymerized aminoplasts

6,670,425

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,653,411

Anti-reflective coating compositions comprising polymerized aminoplasts

6,555,287

Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings

6,524,708

Anti-reflective coating compositions comprising polymerized aminoplasts

6,495,305

Halogenated anti-reflective coatings

6,444,320

Thermosetting anti-reflective coatings for full fill dual damascene process

6,403,152

Anti-reflective coating compositions comprising polymerized aminoplasts

6,399,686

Anti-reflective coating compositions comprising polymerized aminoplasts

6,391,472

Fill material for dual damascene process

6,323,310

Anti-reflective coating compositions comprising polymerized aminoplasts

6,316,160

Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders

6,156,479

Thermosetting anti-reflective coatings

9,110,372

Anti-reflective coatings using vinyl ether crosslinkers

8,383,318

Acid-sensitive, developer-soluble bottom anti-reflective coatings

8,257,910

Underlayers for EUV lithography

7,998,318

Crosslinkable fill compositions for uniformly protecting via and contact holes

7,914,974

Anti-reflective imaging layer for multiple patterning process

7,754,818

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,745,540

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,608,380

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,601,483

Anti-reflective coatings using vinyl ether crosslinkers

7,507,783

Thermally curable middle layer comprising polyhedral oligomeric silsesquioxanes for 193-nm trilayer resist process

7,364,835

Developer-soluble materials and methods of using the same in via-first dual damascene applications

7,323,289

Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

7,261,997

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,108,958

Photosensitive bottom anti-reflective coating

7,038,328

Anti-reflective compositions comprising triazine compounds

6,894,104

Anti-reflective coatings and dual damascene fill compositions comprising stryrene-allyl alcohol copolymers

7,132,219

Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

7,132,216

Non-aromatic chromophores for use in polymer anti-reflective coatings

7,026,237

Fill material for dual damascene processes

6,962,769

Anti-reflective coating composition with improved spin bowl compatibility

6,737,203

Photosensitive resin compositions for color filter applications

6,756,418

Photosensitive resin compositions for color filter applications

6,852,473

Anti-reflective coating conformality control

6,852,474

Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

6,869,747

Organic polymeric antireflective coatings deposited by chemical vapor deposition

6,900,000

Organic polymeric antireflective coatings deposited by chemical vapor deposition

6,936,405

Organic polymeric antireflective coatings deposited by chemical vapor deposition

7,449,230

Lithography pattern shrink process and articles

8,257,910

Underlayers for EUV lithography

9,111,757

Silicone polymers with high refractive indices and extended pot life

10,961,383

Gradient block copolymers for directed self-assembly

10,968,348

Laser-releasable bonding materials for 3-D IC applications

11,078,337

High-Chi Block Copolymers for Directed Self-Assembly

RE40920

Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers

Pending

High-energy pulse clearing of environmentally sensitive CNT thin-film devices

Pending

Adhesion layers for EUV lithography

Pending

Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces

Pending

Laser-Releasable Bonding Materials for 3-D IC Applications

Pending

Poly(cyanocinnamate)s for structural and optical applications

Pending

Permanent bonding and patterning material

Pending

Underlayers for EUV Lithography

Pending

Selective liquidphobic surface modifications

Pending

High-silicon-content wet-removable planarizing layer

Pending

Printable dispersion with tunable viscosity

Pending

Multifunctional materials for temporary bond and debond

pending

Laser-releasable bonding materials for 3-d IC applications

10,961,383

Gradient block copolymers for directed self-assembly

RE41128

Organic anti-reflective coating compositions for advanced microlithography

10,854,451

Superplanarizing spin-on carbon materials

10,770,813

Environmentally sealed, reusable connector for printed flexible electronics

10,734,239

High-chi block copolymers with tunable glass transition temperatures for directed self-assembly

10,617,010

Polymer film stencil process for fan-out wafer-level packaging of semiconductor devices

10,519,333

Multifunctional alcohol dispersions of carbon nanotubes

10,421,878

High-Chi block copolymers for directed self-assembly

10,366,887

Method of using chemically patterned guide layers in chemoepitaxy directing of block co-polymers

10,352,726

Thin-film resistive-based sensor

10,331,032

Photosensitive, developer-soluble bottom anti-reflective coating material

10,329,451

All-organic high refractive index materials

10,317,291

Environmental sensor system and signal processor

10,304,720

Laser ablative dielectric material

RE46841

Spin-on carbon compositions for lithographic processing

10,103,048

Dual-layer bonding material process for temporary bonding of microelectronic substrates to carrier substrates

9,960,038

Processes to pattern small features for advanced patterning needs

9,865,490

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,827,757

Methods of transferring device wafers or layers between carrier substrates and other surfaces

9,827,740

Polyimides as laser release materials for 3-D IC applications

9,738,805

Highly soluble carbon nanotubes with enhanced conductivity

9,728,439

High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach

9,642,258

All-organic inductor-capacitor tank circuit for radio frequency sensor applications

9,640,396

Spin-on spacer materials for double- and triple-patterning lithography

9,638,999

Dual-layer light-sensitive developer soluble bottom anti-reflective coatings for 193-nm lithography

9,611,346

Highly crosslinked polymer dielectric films for improved capacitor performance

9,496,164

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,482,951

Non-covalently crosslinkable materials for photolithography processes

9,472,436

Multiple bonding layers for thin-wafer handling

9,328,426

Nonpolymeric antireflection compositions containing adamantyl groups

7,579,044

Process and device for coating the outer edge of a substrate during microelectronics manufacture

9,299,778

CVD-free, scalable processes for the production of silicon micro- and nanostructures

9,117,757

Silicone polymers with high refractive indices and extended pot life

8,836,082

Reversal lithography approach by selective deposition of nanoparticles

8,668,992

Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients

7,976,894

Materials with thermally reversible curing mechanism

7,833,692

Amine-arresting additives for materials used in photolithographic processes

7,803,458

Hybrid organic-inorganic polymer coatings with high refractive indices

7,749,603

Two-layer transparent electrostatic charge dissipating coating

7,608,342

Photocurable, conductive, transparent polymer coatings

7,192,999

Polyimides for use as high refractive index, thin film materials

6,303,270

Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

5,998,090

High optical density ultra thin organic black matrix system

5,629,665

Conducting-polymer bolometer

9,263,314

Multiple bonding layers for thin-wafer handling

9,224,631

Multiple bonding layers for thin-wafer handling

9,127,126

Development of high-viscosity bonding layer through in-situ polymer chain extension

9,111,981

Method for reversibly mounting a device wafer to a carrier substrate

9,099,512

Article including a device wafer reversibly mountable to a carrier substrate

8,940,104

Cleaning composition for temporary wafer bonding materials

8,852,391

Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate

8,771,442

Cyclic olefin compositions for temporary wafer bonding

8,236,669

High-temperature spin-on temporary bonding compositions

8,221,571

Cyclic olefin compositions for temporary wafer bonding

8,092,628

Cyclic olefin compositions for temporary wafer bonding

7,935,780

High-temperature spin-on temporary bonding compositions

7,713,835

Thermally decomposable spin-on bonding compositions for temporary wafer bonding

9,157,003

Highly soluble carbon nanotubes with enhanced conductivity

8,865,599

Self-leveling planarization materials for microelectronic topography

7,790,231

Automated process and apparatus for planarization of topographical surfaces

7,455,955

Planarization method for multi-layer lithography processing

6,716,767

Contact planarization materials that generate no volatile byproducts or residue during curing

7,775,785

Contact planarization apparatus

8,408,222

Device for coating the outer edge of a substrate during microelectronics manufacturing

9,249,013

Silicon hardmask layer for directed self-assembly

9,123,541

Highly etch-resistant polymer block for use in block copolymers for directed self-assembly

8,771,927

Acid-etch resistant, protective coatings

8,445,591

Spin-on protective coatings for wet-etch processing of microelectronic substrates

8,399,346

Scratch-resistant coatings for protecting front-side circuitry during backside processing

8,268,449

Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive

8,202,442

Spin-on protective coatings for wet-etch processing of microelectronic substrates

8,192,642

Spin-on protective coatings for wet-etch processing of microelectronic substrates

7,758,913

Spin-on protective coatings for wet-etch processing of microelectronic substrates

7,709,178

Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride

7,695,890

Negative photoresist for silicon KOH etch without silicon nitride

7,678,861

Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive

7,316,844

Spin-on protective coatings for wet-etch processing of microelectronic substrate

8,133,659

On-track process for patterning hardmask by multiple dark field exposures

7,939,244

Photosensitive hardmask for microlithography

7,602,066

Method of filling structures for forming via-first dual damascene interconnects

7,364,832

Wet developable hard mask in conjunction with thin photoresist for microphotolithography

7,348,281

Method of filling structures for forming via-first dual damascene interconnects

7,122,296

Lithography pattern shrink process and articles

6,740,469

Developer-soluble metal alkoxide coatings for microelectronic applications

6,080,530

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

6,042,990

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,935,760

Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

5,919,599

Thermosetting anti-reflective coatings at deep ultraviolet

5,919,598

Method for making multilayer resist structures with thermosetting anti-reflective coatings

5,892,096

Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility

5,693,691

Thermosetting anti-reflective coatings compositions

5,688,987

Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility

5,674,648

Anti-reflective coating

5,578,676

Method for making polymers with intrinsic light-absorbing properties

5,368,989

Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating

9,102,129

Spin-on carbon compositions for lithographic processing

8,968,989

Assist layers for EUV lithography

8,895,230

Spin-on carbon compositions for lithographic processing

8,877,430

Methods of producing structures using a developer-soluble layer with multilayer technology

8,808,969

Method of making radiation-sensitive sol-gel materials

8,647,809

Metal-oxide films from small molecules for lithographic applications

8,415,083

On-track process for patterning hardmask by multiple dark field exposures

8,206,893

Photoimageable branched polymer

8,168,372

Method of creating photolithographic structures with developer-trimmed hardmask

6,893,684

Anti-reflective coating compositions for use with low-k dielectric materials

6,872,506

Wet-developable anti-reflective compositions

6,846,612

Organic anti-reflective coating compositions for advanced microlithography

6,680,160

Halogenated anti-reflective coatings

6,670,425

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,663,916

Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings

6,653,411

Anti-reflective coating compositions comprising polymerized aminoplasts

6,576,408

Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose

6,555,287

Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings

6,524,708

Anti-reflective coating compositions comprising polymerized aminoplasts

6,512,084

Anti-reflective coating compositions comprising polymerized aminoplasts

6,495,305

Halogenated anti-reflective coatings

6,444,320

Thermosetting anti-reflective coatings for full fill dual damascene process

6,432,611

Anti-reflective coating compositions comprising polymerized aminoplasts

6,403,152

Anti-reflective coating compositions comprising polymerized aminoplasts

6,399,686

Anti-reflective coating compositions comprising polymerized aminoplasts

6,391,472

Fill material for dual damascene process

6,323,310

Anti-reflective coating compositions comprising polymerized aminoplasts

6,316,160

Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders

6,156,479

Thermosetting anti-reflective coatings

9,110,372

Anti-reflective coatings using vinyl ether crosslinkers

8,383,318

Acid-sensitive, developer-soluble bottom anti-reflective coatings

8,257,910

Underlayers for EUV lithography

7,998,318

Crosslinkable fill compositions for uniformly protecting via and contact holes

7,914,974

Anti-reflective imaging layer for multiple patterning process

7,754,818

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,745,540

Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers

7,608,380

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,601,483

Anti-reflective coatings using vinyl ether crosslinkers

7,507,783

Thermally curable middle layer comprising polyhedral oligomeric silsesquioxanes for 193-nm trilayer resist process

7,364,835

Developer-soluble materials and methods of using the same in via-first dual damascene applications

7,323,289

Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

7,261,997

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

7,132,219

Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

7,132,216

Non-aromatic chromophores for use in polymer anti-reflective coatings

7,108,958

Photosensitive bottom anti-reflective coating

7,038,328

Anti-reflective compositions comprising triazine compounds

7,026,237

Fill material for dual damascene processes

6,962,769

Anti-reflective coating composition with improved spin bowl compatibility

6,894,104

Anti-reflective coatings and dual damascene fill compositions comprising stryrene-allyl alcohol copolymers

10,968,348

Laser-releasable bonding materials for 3-D IC applications

Pending

Laser-Releasable Bonding Materials for 3-D IC Applications

Pending

Permanent bonding and patterning material

Pending

Multifunctional materials for temporary bond and debond

pending

Laser-releasable bonding materials for 3-d IC applications

10,617,010

Polymer film stencil process for fan-out wafer-level packaging of semiconductor devices

10,304,720

Laser ablative dielectric material

10,103,048

Dual-layer bonding material process for temporary bonding of microelectronic substrates to carrier substrates

9,865,490

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,827,757

Methods of transferring device wafers or layers between carrier substrates and other surfaces

9,827,740

Polyimides as laser release materials for 3-D IC applications

9,728,439

High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach

9,472,436

Multiple bonding layers for thin-wafer handling

9,263,314

Multiple bonding layers for thin-wafer handling

9,224,631

Multiple bonding layers for thin-wafer handling

9,127,126

Development of high-viscosity bonding layer through in-situ polymer chain extension

9,111,981

Method for reversibly mounting a device wafer to a carrier substrate

9,099,512

Article including a device wafer reversibly mountable to a carrier substrate

8,940,104

Cleaning composition for temporary wafer bonding materials

8,852,391

Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate

8,771,442

Cyclic olefin compositions for temporary wafer bonding

8,236,669

High-temperature spin-on temporary bonding compositions

8,221,571

Cyclic olefin compositions for temporary wafer bonding

8,092,628

Cyclic olefin compositions for temporary wafer bonding

7,935,780

High-temperature spin-on temporary bonding compositions

7,713,835

Thermally decomposable spin-on bonding compositions for temporary wafer bonding

6,737,203

Photosensitive resin compositions for color filter applications

6,756,418

Photosensitive resin compositions for color filter applications

6,852,473

Anti-reflective coating conformality control

9,111,757

Silicone polymers with high refractive indices and extended pot life

Pending

Poly(cyanocinnamate)s for structural and optical applications

10,329,451

All-organic high refractive index materials

9,611,346

Highly crosslinked polymer dielectric films for improved capacitor performance

9,496,164

Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes

9,299,778

CVD-free, scalable processes for the production of silicon micro- and nanostructures

9,117,757

Silicone polymers with high refractive indices and extended pot life

8,836,082

Reversal lithography approach by selective deposition of nanoparticles

8,668,992

Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients

7,976,894

Materials with thermally reversible curing mechanism

7,833,692

Amine-arresting additives for materials used in photolithographic processes

7,803,458

Hybrid organic-inorganic polymer coatings with high refractive indices

7,749,603

Two-layer transparent electrostatic charge dissipating coating

7,608,342

Photocurable, conductive, transparent polymer coatings

7,192,999

Polyimides for use as high refractive index, thin film materials

6,303,270

Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

5,998,090

High optical density ultra thin organic black matrix system

5,629,665

Conducting-polymer bolometer

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